The Leybold Z401 is a professional plasma dry etcher (Trockenätzer), typically used for semiconductor and microfabrication applications. The system supports reactive ion etching (RIE) for precise substrate patterning. Known for robust German engineering, the Z401 is a classic in research and small-scale production environments.

Technical Summary:

Category: Plasma dry etcher / RIE system
Manufacturer: Leybold AG, Germany
Model: Z401
Typical Applications: Si/SiO₂, metals, dielectrics, and compound semiconductors
Chamber: Vacuum-compatible, designed for plasma/reactive ion etching
Controls: Integrated vacuum and plasma discharge control (may vary unit to unit)
Power and Gases: Configurable for standard etch gases (CF₄, O₂, Ar, etc.)
Connections: Standard high-vacuum flanges & integrated process cabling